Sindermann, Simon; Wall, Dirk; Roos, K.R.; Horn-von Hoegen, Michael; Meyer zu Heringdorf, Frank:
Anisotropy of Ag Diffusion on Vicinal Si Surfaces
2010
In: e-Journal of Surface Science and Nanotechnology, Band 8 (2010), S. 372 - 376
Artikel/Aufsatz in Zeitschrift / Fach: Physik
Fakultät für Physik » Experimentalphysik
Titel:
Anisotropy of Ag Diffusion on Vicinal Si Surfaces
Autor(in):
Sindermann, Simon im Online-Personal- und -Vorlesungsverzeichnis LSF anzeigen; Wall, Dirk im Online-Personal- und -Vorlesungsverzeichnis LSF anzeigen; Roos, K.R.; Horn-von Hoegen, Michael im Online-Personal- und -Vorlesungsverzeichnis LSF anzeigen; Meyer zu Heringdorf, Frank im Online-Personal- und -Vorlesungsverzeichnis LSF anzeigen
Erscheinungsjahr:
2010
Erschienen in:
e-Journal of Surface Science and Nanotechnology, Band 8 (2010), S. 372 - 376
ISSN:
DOI:

Abstract:

Photoemission electron microscopy (PEEM) is used to study Ag surface diffusion on vicinal Si surfaces. The diffusion field is represented by Iso-Coverage Zones around Ag islands during desorption. By analyzing the shape and radius of the Iso-Coverage Zone we can determine diffusion parameters. For anisotropic diffusion the zone has an elliptical shape and the aspect ratio gives a measure for the anisotropy. Using this technique, we study the degree of anisotropy of Ag diffusion on vicinal Si(001) and Si(111). With increasing miscut angles, starting from Si(001) as well as from Si(111), we find a gradually increasing anisotropy, caused by the higher step density. On higher index surfaces, like Si(119), Si(115) and Si(113), we find isotropic diffusion for surfaces with comparable dimer and (double) step structure as on Si(001)-4°, where diffusion is strongly anisotropic.