Stella, Kevin; Bürstel, Damian; Hasselbrink, Eckart; Diesing, Detlef:
Thin Tantalum Films on Crystalline Silicon - A Metallic Glass
2011
In: Physica Status Solidi: Rapid Research Letters, Band 5 (2011), S. 68 - 70
Artikel/Aufsatz in Zeitschrift2011Chemie
Titel:
Thin Tantalum Films on Crystalline Silicon - A Metallic Glass
Autor(in):
Stella, KevinLSF; Bürstel, DamianLSF; Hasselbrink, EckartLSF; Diesing, DetlefLSF
Erscheinungsjahr
2011
DOI:

Abstract:

Thin amorphous tantalum films are prepared on Si(111) substrates in a metallic glassy state. The amorphous monoatomic state of the film is characterized by X-ray diffraction studies. The glassy state leads to a negative temperature coefficient of the resistivity (TCR) for low sample temperatures <200 K which is attributed to incipient localization. Above 200 K a positive TCR is observed as expected for a normal Boltzmann transport regime. Upon heating the Si substrate to 1200 K TaSi2 is formed out of the amorphous tantalum film and the silicon substrate. The TaSi2 layer is crystalline as evident from X-ray diffraction data.