Ronning, Carsten; Borschel, Christian; Geburt, Sebastian; Niepelt, Raphael; Müller, S.; Stichtenoth, Daniel; Richters, J.-P.; Dev, A.; Voss, T.; Chen, L.; Heimbrodt, W.; Gutsche, Christoph; Prost, Werner:
Tailoring the properties of semiconductor nanowires using ion beams
2010
In: Physica Status Solidi: B - Basic Solid State Physics, Jg. Vol. 247 (2010), Heft No. 10, S. 2329 - 2337
Artikel/Aufsatz in Zeitschrift / Fach: Elektrotechnik
Titel:
Tailoring the properties of semiconductor nanowires using ion beams
Autor(in):
Ronning, Carsten; Borschel, Christian; Geburt, Sebastian; Niepelt, Raphael; Müller, S.; Stichtenoth, Daniel; Richters, J.-P.; Dev, A.; Voss, T.; Chen, L.; Heimbrodt, W.; Gutsche, Christoph im Online-Personal- und -Vorlesungsverzeichnis LSF anzeigen; Prost, Werner im Online-Personal- und -Vorlesungsverzeichnis LSF anzeigen
Erscheinungsjahr:
2010
Erschienen in:
Physica Status Solidi: B - Basic Solid State Physics, Jg. Vol. 247 (2010), Heft No. 10, S. 2329 - 2337
ISSN:

Abstract:

This review demonstrates that ion irradiation is a very useful tool in order to tailor the properties of semiconductor nanowires. Besides optical and electrical doping provided by adequate ion species and ion energies, one can use ion beams also for the controlled shaping of the morphology of nanostructures. Here, one utilizes the commonly as ‘negative’ described characteristics of ion implantation: defect formation and sputtering. We show that ion beams can be even used for an alignment of the nanowires. Furthermore, we report here on several successful experiments in order to modify the electrical and optical properties in a controlled manner of ZnO semiconductor nanowires by the use of transition metals, rare earth elements and hydrogen ions.