Strasser, Patrick; Wüest, Robert; Rauscher, K.; Robin, Franck; Erni, Daniel; Jäckel, Heinz:
InP-basedphosphide photonic crystals
In: Electron-beam lithography applications at ETH Zurich - ETH Zürich: Raith Application Note, Raith GmbH, 2006, S. 1 - 6
Buchaufsatz/Kapitel in Sammelwerk2006Elektrotechnik
Titel:
InP-basedphosphide photonic crystals
Autor(in):
Strasser, Patrick; Wüest, Robert; Rauscher, K.; Robin, Franck; Erni, DanielLSF; Jäckel, Heinz
Erscheinungsjahr
2006
WWW URL

Abstract:

Within the FIRST Center for Micro- and Nanoscience of the ETH Zurich, we use a RAITH150 electron beam lithography (EBL) system for a large palette of projects in photonics, electronics, material science, and physics. An overview of our main research activities in these fields is given below.