InP-basedphosphide photonic crystals
In: Electron-beam lithography applications at ETH Zurich (F. Robin)
ETH Zurich: Raith Application Note, Raith GmbH (2006), pp. 1-6
Buchaufsatz / Kapitel / Fach: Elektrotechnik
Abstract:
Within the FIRST Center for Micro- and Nanoscience of the ETH Zurich, we use a RAITH150 electron beam lithography (EBL) system for a large palette of projects in photonics, electronics, material science, and physics. An overview of our main research activities in these fields is given below.
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