Strasser, Patrick; Wüest, Robert; Rauscher, K.; Robin, Franck; Erni, Daniel; Jäckel, Heinz:

InP-basedphosphide photonic crystals

In: Electron-beam lithography applications at ETH Zurich
ETH Zürich: Raith Application Note, Raith GmbH (2006), S. 1-6
Buchaufsatz / Kapitel / Fach: Elektrotechnik
Within the FIRST Center for Micro- and Nanoscience of the ETH Zurich, we use a RAITH150 electron beam lithography (EBL) system for a large palette of projects in photonics, electronics, material science, and physics. An overview of our main research activities in these fields is given below.