Finder, C.; Beck, M.; Seekamp, J.; Pfeiffer, K.; Carlberg, P.; Maximov, I.; Reuther, F.; Sarve, E.l.; Zankovich, S.; Ahopelto, J.; Montelius, L.; Mayer, C.; Sotomayor Torres, C.m.:
Fluorescence microscopy for quality control in nanoimprint lithography
2003
In: Microelectronic Engineering, Band 67/68 (2003), S. 623 - 628
Artikel/Aufsatz in Zeitschrift2003Chemie
Titel:
Fluorescence microscopy for quality control in nanoimprint lithography
Autor(in):
Finder, C.; Beck, M.; Seekamp, J.; Pfeiffer, K.; Carlberg, P.; Maximov, I.; Reuther, F.; Sarve, E.l.; Zankovich, S.; Ahopelto, J.; Montelius, L.; Mayer, C.LSF; Sotomayor Torres, C.m.
Erscheinungsjahr
2003